| 引用本文: | 吴其芬.关于应用外加电场和磁场减小等离子体鞘内电子数密度方案可行性的初探.[J].国防科技大学学报,1985,(1):23-28.[点击复制] |
| Wu Qifen.The Preliminary Study of the Possibility for Reduction of Density of Electronic Number in Plasma Sheath Using Applied Electric and Magnetic Field[J].Journal of National University of Defense Technology,1985,(1):23-28[点击复制] |
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| 关于应用外加电场和磁场减小等离子体鞘内电子数密度方案可行性的初探 |
| 吴其芬 |
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| 摘要: |
| 本文应用磁流体力学基础理论，分析了在磁场和电场联合作用下，等离子体鞘中模型流动。初步分析表明，只要合理地放置电极，适当选择外加电场和磁场，应用这种方法可指望在等离子体鞘的局部区域有较显著的电子数密度减小。 |
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| 投稿日期：1984-10-18 |
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| The Preliminary Study of the Possibility for Reduction of Density of Electronic Number in Plasma Sheath Using Applied Electric and Magnetic Field |
| Wu Qifen |
| Abstract: |
| Applying basic magneto fluid dynamic theory，the author analyzes the model f1owing in plasma sheath under the combined action of magnetic and electric field. Preliminary analysis shows that the density of the electronic number in parts of the plasma sheath is expected to be remarkably reduced if only electrodes are appropriately placed and applied electric and magnetic fields are proper1y selected. |
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