吴其芬.关于应用外加电场和磁场减小等离子体鞘内电子数密度方案可行性的初探[J].国防科技大学学报,1985,(1):23-28.
Wu Qifen. The Preliminary Study of the Possibility for Reduction of Density of Electronic Number in Plasma Sheath Using Applied Electric and Magnetic Field[J]. Journal of National University of Defense Technology,1985,(1):23-28.