In order to further research the physics characteristics of nano-semiconductor, we get the nanometer size InSb particle films deposited on the SiO₂ substrate by using vacuum evaporation. The atomic force microscope was applied to survey the surface morphology of the films. The results show that the films are composite of nano-particles of InSb. From the analysis of the scanning images of these samples, the result of the experiment proves that by changing the plating time, different sizes of InSb particle can be formed.