SmCo thin films were prepared by DC magnetron sputtering and the relations between the technological parameters and its depositing rate were studied. The analysis of orthogonal experiments of technological parameters indicates that the sputtering power and the distance between the target and substrate have greater influences on the depositing rate, in contrast to that of Ar pressure in range of 0.5～2.0 Pa. X-ray diffraction reveals that the microstructure of as-deposited SmCo film is amorphous, and a little amount of SmCo₅crystal appears after annealed at 500℃ in vacuum. As for the magnetic properties, the coercive force (H_c) of as-deposited film decreases with the increase of the thickness of the film. The reason why the annealing treatment leads to the decreases of H_c and saturated magnetic field, and the improvement of the initial magnetic susceptibility and saturated magnetization obviously is the reduction of the microstructure defection and the composition undulation during the treatment.