二维半导体晶体管与集成电路研究进展
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国防科技大学 前沿交叉学科学院 新型纳米光电信息材料与器件湖南省重点实验室

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TN386

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国家自然科学基金项目(面上项目)编号12174444


Progress of Two-Dimensional Semiconductor Transistors and Integrated Circuits
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    摘要:

    二维半导体,以其原子级厚度、表面光滑无悬挂键及对短沟道效应的抑制能力,被国际半导体技术路线图确立为未来亚纳米节点的关键候选材料。文章围绕二维半导体从基础材料科学到系统级集成的全链条发展现状,分析了二维半导体相较于传统硅基材料的本征物理优势与制备工艺进展,重点评述了二维半导体晶体管接触电阻工程、栅介质集成、器件架构演进等核心工艺模块的最新进展与技术瓶颈。同时详细追溯了从早期单晶体管验证到较大规模集成电路的发展脉络,分析了集成过程中的材料-工艺-设计协同挑战,并进一步探讨了未来二维半导体在感存算一体、神经形态计算及异质集成等新兴范式中的独特潜力。

    Abstract:

    Two-dimensional semiconductors are identified by the International Roadmap for Devices and Systems as key candidate materials for future sub-1nm nodes, owing to their atomic-scale thickness, smooth surface without dangling bonds and capability to suppress short-channel effects. Focusing on the current status of the full-chain development of two-dimensional semiconductors from basic materials science to system-level integration, the intrinsic physical advantages over traditional silicon-based materials and the progress in preparation processes were systematically analyzed. The latest progress and technical bottlenecks of core process modules including contact resistance engineering, gate dielectric integration and device architecture evolution of two-dimensional semiconductor transistors were reviewed in detail. Meanwhile, the development trajectory from early single-transistor verification to large-scale integrated circuits was traced comprehensively, and the collaborative challenges among materials, processes and design during the integration process were analyzed. The unique potential of two-dimensional semiconductors in emerging paradigms such as in-sensor computing, neuromorphic computing and van der Waals heterogeneous integration is further discussed.

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  • 收稿日期:2026-01-22
  • 最后修改日期:2026-03-24
  • 录用日期:2026-03-26
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