| 引用本文: | 戴一帆,尚文锦,周旭升.计算机控制小工具抛光技术中磨盘材料对去除函数的影响.[J].国防科技大学学报,2006,28(2):97-101.[点击复制] |
| DAI Yifan,SHANG WenJin,ZHOU Xusheng.Effection of the Material of a Small Tool to the Removal Function in Computer Control Optical Polishing[J].Journal of National University of Defense Technology,2006,28(2):97-101[点击复制] |
|
| |
|
|
| 本文已被：浏览 6838次 下载 6339次 |
| 计算机控制小工具抛光技术中磨盘材料对去除函数的影响 |
| 戴一帆, 尚文锦, 周旭升 |
|
(国防科技大学 机电工程与自动化学院，湖南 长沙 410073)
|
| 摘要: |
| 研究了计算机控制小工具抛光(CCOP)加工中三种常用的磨盘材料对去除函数特性的影响，进一步完善材料去除模型，用以指导光学零件的加工。利用自行研制的AOCMT光学加工机床及接触式测量系统进行实验和分析。从去除函数形状、去除效率及稳定性、表面形貌三个方面进行了研究。实验结果表明：聚氨酯材料适用于粗抛光阶段；阻尼布材料适用于精抛光阶段；沥青材料适用于最后的修形加工和表面处理。 |
| 关键词: CCOP 去除函数 聚氨酯 阻尼布 沥青 |
| DOI： |
| 投稿日期：2005-11-08 |
| 基金项目:国家自然科学基金资助项目(50375156) |
|
| Effection of the Material of a Small Tool to the Removal Function in Computer Control Optical Polishing |
| DAI Yifan, SHANG WenJin, ZHOU Xusheng |
|
(College of Mechatronics Engineering and Automation,National Univ. of Defense Technology, Changsha 410073, China)
|
| Abstract: |
| The effect of the three kinds of material on the removal function is studied. The considering properties of the removal function include the removal profile, the removal rate, the stability of the removal function and the surface topography. A series of experiments have been done to the perfect properties of the removal function. The experiments were done on the AOCMT machine tool and the contact measurement system developed by ourselves. The results were presented as follows. Polyurethane is used in the step of the rough polish. Polishing cloth is used in the step of the finishing polish. Polishing pitch (55# polishing pitch by GuGolz Corporation ) is used in the step of the surface treatment or the finishing polish. |
| Keywords: CCOP the removal function polyurethane polishing cloth polishing pitch |
|
|
