| 引用本文: | 万稳,戴一帆,石峰,等.提升熔石英抗激光损伤性能的磁流变与HF刻蚀结合方法.[J].国防科技大学学报,2015,37(6):8-11.[点击复制] |
| WAN Wen,DAI Yifan,SHI Feng,et al.Improving the laser damage performance of fused silica by combining magnetorheological finishing with HF acid etching[J].Journal of National University of Defense Technology,2015,37(6):8-11[点击复制] |
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| 提升熔石英抗激光损伤性能的磁流变与HF刻蚀结合方法 |
| 万稳1,2, 戴一帆1,2, 石峰1,2, 彭小强1,2 |
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(1.国防科技大学 机电工程与自动化学院， 湖南 长沙 410073;2.
2. 超精密加工技术湖南省重点实验室， 湖南 长沙 410073)
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| 摘要: |
| 为提升紫外熔石英元件抗激光损伤性能，针对传统加工方法在加工过程中产生的破碎性缺陷和污染性缺陷，提出使用磁流变抛光结合HF酸刻蚀的组合工艺提升紫外熔石英元件抗激光损伤性能的方法。磁流变抛光特有的剪切去除原理能够有效去除传统加工过程产生的破碎性缺陷，同时不产生新的破碎性缺陷。HF酸动态酸刻蚀能够有效减少加工过程中产生的金属元素污染。实验结果表明：经过组合工艺处理的熔石英样品，在7J/cm2·3ω激光通量辐照下损伤密度由0.2mm-2降至0.008mm-2，在8J/cm2·3ω激光通量辐照下损伤密度由1mm-2降至0.1mm-2，其元件抗损伤性能提升显著。 |
| 关键词: 熔石英 磁流变抛光 HF酸刻蚀 缺陷 损伤密度 |
| DOI：10.11887/j.cn.201506002 |
| 投稿日期：2015-06-06 |
| 基金项目:国家自然科学基金资助项目（5127552，91323302） |
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| Improving the laser damage performance of fused silica by combining magnetorheological finishing with HF acid etching |
| WAN Wen1,2, DAI Yifan1,2, SHI Feng1,2, PENG Xiaoqiang1,2 |
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(1. College of Mechatronics Engineering and Automation, National University of Defense Technology, Changsha 410073, China;2.
2. Hunan Key Laboratory of Ultraprecision Machining Technology, Changsha 410073, China)
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| Abstract: |
| In order to improve the laser damage performance of ultraviolet fused silica, a method which combines magneto-rheological finishing (MRF) with HF acid etching process was proposed to reduce crack and contamination defects in the machining process of traditional processing method. MRF can effectively remove the crack defects with its unique shear and removal principle in traditional machining process while not produce new crack defect. HF acid etching process can effectively reduce metal elements contamination. The experimental results show that fused silica sample using the combined process has a better anti damage performance. Damage density reduced from 0.2mm-2 to 0.008mm-2 under the laser flux irradiation of 7J/cm2?3ω and from 1mm-2 to 0.1mm-2 at the irradiation of 8J/cm2?3ω. |
| Keywords: fused silica magnetorheological finishing HF acid etching defects damage density |
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