The Effect of Wall Injection of Teflon Ablating Material onElectron Number Density

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The Effect of Wall Injection of Teflon Ablating Material onElectron Number Density
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Abstract:

The chemical non-equilibrium flows over a teflon ablative wall are calculated numerically by solving NS equations with pure-air and teflon-air chemical reaction system. The overall teflon-air chemical system used consists of 19 species and 28 reactions. The effect of wall injection of teflon ablating material on electron number density are discussed.

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SHI Yuzhong, WANG Maoyan, YIN Le, CHEN Weifang. The Effect of Wall Injection of Teflon Ablating Material onElectron Number Density[J]. Journal of National University of Defense Technology,2004,26(6):30-33.

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Received:March 28,2004
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Online: May 08,2013
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